Duocel® Foam Diffuser Discs
- -Cost Effective
- -Low Expansion Coefficient
- -Cost Effective
- -Corrosion Resistant
Why would you use Duocel® foam diffuser discs?
The disks are custom designed accordingly to provide appropriate diameter, thickness, pressure drop, and surface area for your specific application. Most diffusers are currently made out of 6101 aluminum alloy, a very pure material which has a lack of high atomic number alloying agents and low residual alloying content. As the concept of foam materials becomes more familiar in the semiconductor industry, vitreous carbon and silicon carbide foams are being introduced to address applications which involve higher temperatures or chemicals incompatible with aluminum as well.
Who uses Duocel® foam diffuser discs?
ERG designs and manufactures a number of standardized aluminum foam discs that are used in several semiconductor processing machines made by Branson, LAM Research, Applied Materials and others. Our diffuser discs are used in CVD and etching research machines at leading universities as well. The following diffuser discs are always in stock and custom diffuser discs are available upon special request.
The LAM diffuser discs are commonly referred to as a diffuser disc, disc diffuser, or diffuser cathode and are manufactured from pure semiconductor certified aluminum alloy 6101. ERG is the OEM manufacturer of these parts for the LAM Autoetch and Rainbow machine. ERG has been the single source OEM supplier of these parts since 1975. As an end item user or foreign distributor you may purchase directly from ERG at the listed prices. Delivery can be next day air as ample parts are always in stock for off-the-shelf delivery. In quantities less than 10 each there is a slight price increase.
|LAM Machine||Auto Etch||Auto Etch||Rainbow|
|ERG P/N||005-01-01-074, Rev A||005-01-01-144, Rev A||005-01-01-167, Rev A|
|Retail Price||For the most up to date retail prices visit K. R. Reynolds.|
|Wholesale Price||For resellers contact us for wholesale prices.|
The processes of dry etching and Chemical Vapor Deposition (CVD) require precise control of gas flows and the ionized plasma field to enable the uniform deposition and removal of materials. Through such precise control, the yield of sub-micron path width chips can be improved greatly. One of our products designed specifically to address these issues is an input gas diffuser disk. The diffuser disk consists of 40 PPI foam which has been compressed to provide an even greater specific surface area. The disk is generally mounted in contact with the upstream of a shower head. In this position, the disk performs four primary functions:
1. Uniform Gas Distribution: Using the high specific area and constant viscosity (flow friction) of gases at low pressures, the disk provides uniform pressure drop and distribution of gasses to all areas of the shower head regardless of turbulence or flow asymmetry in the diffusion chamber.
2. Orifice Flow Stabilization: By acting as a fluid flow straightener, gasses enter all shower head ports in a uniaxial direction with uniform velocity. This uniformity minimizes the chugging, or flutter, which occurs in such orifices as a result of upstream cross flow and turbulence.
3. Plasma Stabilizer: The diffuser disk acts as a grounding plate and flame arrestor, preventing backfiring or arcing of the plasma back up through the shower head and into the diffusion chamber. This arcing can occur as a result of plasma instability and manufacturing irregularities in the shower head. Unfortunately, the arcing not only disrupts the current process, but also damages the shower head, thus increasing the likelihood of further arcing and process disruption. The diffuser disk can inhibit this behavior and stabilize the plasma process.
4. Contamination Filtration and Condensation: While not normally needed in a properly operating system, there have been cases where the disk has served to accumulate particulate and vaporous contamination entering the diffusion chamber due to some type of upstream problem. By providing a fluid flow disruption and a large surface area available for attachment, the contaminants often preferentially attach to the disk. The resulting symptom is a clogged disk and reduced fluid flow, which is usually preferable to the contaminants passing freely into the plasma zone.
Depending on the equipment and process details, these functions assume various degrees of importance. The disks are custom designed accordingly to provide appropriate diameter, thickness, pressure drop, and surface area for your specific application. Most diffusers are currently made out of 6101 aluminum alloy, a very pure material which is used regularly in the nuclear power industry because of its lack of high atomic number alloying agents and low residual alloying content. As the concept of foam materials becomes more familiar in the semiconductor industry, vitreous carbon and silicon carbide foams are being introduced to address applications which involve higher temperatures or chemicals incompatible with aluminum as well.